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Article (Scientific journals)
Multiscale Modelling of the Electrostatic Impact of Self-Assembled Monolayers Used as Gate Dielectric Treatment in Organic Thin-Film Transistors
Mityashin, A.; Roscioni, O.M.; Muccioli, L. et al.
2014In ACS Applied Materials and Interfaces, 6, p. 15372
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Research center :
CIRMAP - Centre d'Innovation et de Recherche en Matériaux Polymères
Disciplines :
Physics
Author, co-author :
Mityashin, A.
Roscioni, O.M.
Muccioli, L.
Zannoni, C.
Geskin, V.
Cornil, Jérôme ;  Université de Mons > Faculté des Sciences > Service de Chimie des matériaux nouveaux
Janssen, D.
Steudel, S.
Genoe, Jan
Heremans, P.
Language :
English
Title :
Multiscale Modelling of the Electrostatic Impact of Self-Assembled Monolayers Used as Gate Dielectric Treatment in Organic Thin-Film Transistors
Publication date :
01 January 2014
Journal title :
ACS Applied Materials and Interfaces
ISSN :
1944-8244
Publisher :
American Chemical Society, United States - District of Columbia
Volume :
6
Pages :
15372
Peer reviewed :
Peer Reviewed verified by ORBi
Research unit :
S817 - Chimie des matériaux nouveaux
Research institute :
R400 - Institut de Recherche en Science et Ingénierie des Matériaux
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since 19 December 2014

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