Nazeeruddin, M.K., Kay, A., Rodico, I., Humphry-Baker, R., Müller, E., Liska, P., Vlachopoulos, N., Gratzel, M., Conversion of light to electricity by cis-X2Bis(2,2’-bipyridyl-4,4’-dicarboxylate)ruthenium(II) charge transfer sensitizers (X=Cl-, Br-, I-, CN-, and SCN-) on nanocrystalline Ti02 electrodes. J. Am. Chem. Soc. 115 (1993), 6382–6390, 10.1021/ja00067a063.
Sayama, Kazuhiro, Sugihara, Hideki, Arakawa, H., Photoelectrochemical properties of a porous Nb2O5 electrode sensitized by a ruthenium dye. Chem. Mater. 10 (1998), 3825–3832, 10.1021/CM980111L.
O'Regan, B., Grätzel, M., A low-cost, high-efficiency solar cell based on dye-sensitized colloidal TiO2 films. Nature 353 (1991), 737–740, 10.1038/353737a0.
Kakiage, K., Aoyama, Y., Yano, T., Oya, K., Fujisawa, J., Hanaya, M., Highly-efficient dye-sensitized solar cells with collaborative sensitization by silyl-anchor and carboxy-anchor dyes. Chem. Commun. 51 (2015), 15894–15897, 10.1039/C5CC06759F.
Liu, H., Yao, T., Ding, W., Wang, H., Ju, D., Chai, W., Study on the optical property and surface morphology of N doped TiO2 film deposited with different N2 flow rates by DCPMS. J. Environ. Sci. 25 (2013), S54–S58, 10.1016/S1001-0742(14)60626-4.
Wong, M.-S., Lee, M.-F., Chen, C.-L., Huang, C.-H., Vapor deposited sculptured nano-porous titania films by glancing angle deposition for efficiency enhancement in dye-sensitized solar cells. Thin Solid Films 519 (2010), 1717–1722, 10.1016/j.tsf.2010.06.047.
Zhu, L., Xie, J., Cui, X., Shen, J., Yang, X., Zhang, Z., Photoelectrochemical and optical properties of N-doped TiO2 thin films prepared by oxidation of sputtered TiNx films. Vacuum 84 (2010), 797–802, 10.1016/j.vacuum.2009.10.040.
Asahi, R., Morikawa, T., Irie, H., Ohwaki, T., Nitrogen-doped titanium dioxide as visible-light-sensitive photocatalyst: designs, developments, and prospects. Chem. Rev. 114 (2014), 9824–9852, 10.1021/cr5000738.
Prabakar, K., Takahashi, T., Nezuka, T., Takahashi, K., Nakashima, T., Kubota, Y., Fujishima, A., Visible light-active nitrogen-doped TiO2 thin films prepared by DC magnetron sputtering used as a photocatalyst. Renew. Energy. 33 (2008), 277–281, 10.1016/j.renene.2007.05.018.
Kavan, L., Grätzel, M., Gilbert, S.E., Klemenz, C., Scheel, H.J., Electrochemical and photoelectrochemical investigation of single-crystal anatase. J. Am. Chem. Soc. 28 (1996), 6716–6723, 10.1021/JA954172L.
Cahen, David, Gary, Hodes, Michael, Grätzel, François, Guillemoles Jean, Ilan, Riess, Nature of photovoltaic action in dye-sensitized solar cells. J. Phys. Chem. B 9 (2000), 2053–2059, 10.1021/JP993187T.
Bally, A.R., Hones, P., Sanjinés, R., Schmid, P.E., Lévy, F., Mechanical and electrical properties of fcc TiO1+x thin films prepared by r.f. reactive sputtering. Surf. Coat. Technol. 108–109 (1998), 166–170, 10.1016/S0257-8972(98)00629-X.
Boschloo, G., Häggman, L., Hagfeldt, A., Quantification of the effect of 4-tert-butylpyridine addition to I-/I3- redox electrolytes in dye-sensitized nanostructured TiO2 solar cells. J. Phys. Chem. B 110 (2006), 13144–13150, 10.1021/jp0619641.
Guo, W., Wu, L., Chen, Z., Boschloo, G., Hagfeldt, A., Ma, T., Highly efficient dye-sensitized solar cells based on nitrogen-doped titania with excellent stability. J. Photochem. Photobiol. A Chem. 219 (2011), 180–187, 10.1016/j.jphotochem.2011.01.004.
González-García, L., Idígoras, J., González-Elipe, A.R., Barranco, A., Anta, J.A., Charge collection properties of dye-sensitized solar cells based on 1-dimensional TiO2 porous nanostructures and ionic-liquid electrolytes. J. Photochem. Photobiol. A Chem. 241 (2012), 58–66, 10.1016/J.JPHOTOCHEM.2012.05.015.
Ma, Tingli, Akiyama, Morito, Abe, Eiichi, Isao, Imai, High-efficiency dye-sensitized solar cell based on a nitrogen-doped nanostructured titania electrode. Nano Lett. 12 (2005), 2543–2547, 10.1021/NL051885L.
Guo, W., Shen, Y., Boschloo, G., Hagfeldt, A., Ma, T., Influence of nitrogen dopants on N-doped TiO2 electrodes and their applications in dye-sensitized solar cells. Electrochim. Acta 56 (2011), 4611–4617, 10.1016/j.electacta.2011.02.091.
Tian, H.J., Hu, L.H., Zhang, C.N., Liu, W.Q., Huang, Y., Mo, L., Guo, L., Sheng, J., Dai, S.Y., Retarded charge recombination in dye-sensitized nitrogen-doped TiO2 solar cells. J. Phys. Chem. C 114 (2010), 1627–1632, 10.1021/jp9103646.
L. Tian, G. Giusti, A. Soum-Glaude, C.Y. Dan, L. Cagnon, F. Volpi, A. Mantoux, S. Daniele, E. Blanquet, D. Bellet, Characterization of nitrogen-doped TiO2 thin films for photovoltaic applications, in: 2013 IEEE 39th Photovolt. Spec. Conf. (2013) 2479–2482. https://doi.org/10.1109/PVSC.2013.6744978.
Di Valentin, C., Pacchioni, G., Trends in non-metal doping of anatase TiO2: B, C, N and F. Catal. Today 206 (2013), 12–18, 10.1016/j.cattod.2011.11.030.
Dozzi, M.V., Selli, E., Doping TiO2 with p-block elements: Effects on photocatalytic activity. J. Photochem. Photobiol. C Photochem. Rev. 14 (2013), 13–28, 10.1016/j.jphotochemrev.2012.09.002.
Kang, S.H., Kim, H.S., Kim, J.Y., Sung, Y.E., Enhanced photocurrent of nitrogen-doped TiO2 film for dye-sensitized solar cells. Mater. Chem. Phys. 124 (2010), 422–426, 10.1016/j.matchemphys.2010.06.059.
Livraghi, S., Paganini, M.C., Giamello, E., Selloni, A., Di Valentin, C., Pacchioni, G., Origin of photoactivity of nitrogen-doped titanium dioxide under visible light. J. Am. Chem. Soc. 128 (2006), 15666–15671, 10.1021/ja064164c.
Duarte, D.A., Massi, M., da Silva Sobrinho, A.S., Development of dye-sensitized solar cells with sputtered N-doped TiO2 thin films: From modeling the growth mechanism of the films to fabrication of the solar cells. Int. J. Photoenergy 2014 (2014), 1–13, 10.1155/2014/839757.
Vasu, K., Sreedhara, M.B., Ghatak, J., Rao, C.N.R., Atomic layer deposition of p-type epitaxial thin films of undoped and N-doped anatase TiO2. ACS Appl. Mater. Interfaces 8 (2016), 7897–7901, 10.1021/acsami.6b00628.
Batzill, M., Morales, E.H., Diebold, U., Surface studies of nitrogen implanted TiO2. Chem. Phys. 339 (2007), 36–43, 10.1016/j.chemphys.2007.07.037.
Diwald, O., Thompson, T.L., Goralski, E.G., Walck, S.D., Yates, J.T., The effect of nitrogen ion implantation on the photoactivity of TiO2 rutile single crystals. J. Phys. Chem. B 108 (2004), 52–57, 10.1021/jp030529t.
Ghicov, A., Macak, J.M., Tsuchiya, H., Kunze, J., Haeublein, V., Frey, L., Schmuki, P., Ion implantation and annealing for an efficient N-doping of TiO2 nanotubes. Nano Lett. 6 (2006), 1080–1082, 10.1021/nl0600979.
Baker, M.A., Fakhouri, H., Grilli, R., Pulpytel, J., Smith, W., Arefi-Khonsari, F., Effect of total gas pressure and O2/N2 flow rate on the nanostructure of N-doped TiO2 thin films deposited by reactive sputtering. Thin Solid Films 552 (2014), 10–17, 10.1016/j.tsf.2013.11.111.
Abadias, G., Paumier, F., Eyidi, D., Guérin, P., Girardeau, T., Structure and properties of nitrogen-doped titanium dioxide thin films produced by reactive magnetron sputtering. Surf. Interface Anal. 42 (2010), 970–973, 10.1002/sia.3220.
Lindgren, T., Mwabora, J.M., Avendaño, E., Jonsson, J., Hoel, A., Granqvist, C.-G., Lindquist, S.-E., Photoelectrochemical and optical properties of nitrogen doped titanium dioxide films prepared by reactive DC magnetron sputtering. J. Phys. Chem. B 107 (2003), 5709–5716, 10.1021/jp027345j.
Chan, M.-H., Lu, F.-H., Preparation of titanium oxynitride thin films by reactive sputtering using air/Ar mixtures. Surf. Coat. Technol. 203 (2008), 614–618, 10.1016/j.surfcoat.2008.04.094.
Chan, M.H., Lu, F.H., Characterization of N-doped TiO2 films prepared by reactive sputtering using air/Ar mixtures. Thin Solid Films. 518 (2009), 1369–1372, 10.1016/j.tsf.2009.09.062.
Panepinto, A., Dervaux, J., Cormier, P., Boujtita, M., Odobel, F., Snyders, R., Synthesis of p-type N-doped TiO 2 thin films by co-reactive magnetron sputtering. Plasma Process. Polym. 17 (2020), 1900203–1900209, 10.1002/ppap.201900203.
Stepanov, A.L., Applications of ion implantation for modification of TiO 2: A review. Rev. Adv. Mater. Sci. 30 (2012), 150–165.
A. Reviews, S.T. Picraux, S.N. Laboratories, Ion implantation in metals 1, 31 (1984).
Liu, J., Zhao, S., Wang, H., Cui, Y., Jiang, W., Liu, S., Wang, N., Liu, C., Chai, W., Ding, W., Study on the chemical bond structure and chemical stability of N doped into TiO2 film by N ion beam implantation. Micro Nano Lett. 11 (2016), 758–761, 10.1049/mnl.2016.0322.
Nambu, A., Graciani, J., Rodriguez, J.A., Wu, Q., Fujita, E., Sanz, J.F., N doping of TiO 2(110) Photoemission and density-functional studies. J. Chem. Phys. 125 (2006), 094706–94708.
Yoshida, T., Niimi, S., Yamamoto, M., Ogawa, S., Nomoto, T., Yagi, S., Characterization of nitrogen ion implanted TiO2 photocatalysts by XAFS and XPS. Nucl. Instrum. Methods Phys. Res. Sect. B Beam Interact. Mater. Atoms. 365 (2015), 79–81, 10.1016/j.nimb.2015.04.010.
Panepinto, A., Cornil, D., Guttmann, P., Bittencourt, C., Cornil, J., Snyders, R., Fine control of the chemistry of nitrogen doping in TiO2: a joint experimental and theoretical study. J. Phys. Chem. C 124 (2020), 17401–17412, 10.1021/acs.jpcc.0c05003.
Hwang, S.D., Kim, S.W., Lee, W.K., Kim, E.J., Hahn, S.H., Visible light photocatalytic activity of N-ion implanted TiO2 thin films prepared by oblique incident electron-beam evaporation method. J. Nanosci. Nanotechnol. 13 (2013), 7059–7061, 10.1166/jnn.2013.7800.
Shen, H., Mi, L., Xu, P., Shen, W., Wang, P.N., Visible-light photocatalysis of nitrogen-doped TiO2 nanoparticulate films prepared by low-energy ion implantation. Appl. Surf. Sci. 253 (2007), 7024–7028, 10.1016/j.apsusc.2007.02.023.
Palgrave, R.G., Payne, D.J., Egdell, R.G., Nitrogen diffusion in doped TiO2 (110) single crystals: A combined XPS and SIMS study. J. Mater. Chem. 19 (2009), 8418–8425, 10.1039/b913267h.
Batzill, M., Morales, E.H., Diebold, U., Influence of nitrogen doping on the defect formation and surface properties of TiO2 rutile and anatase. Phys. Rev. Lett. 96 (2006), 026103–26104, 10.1103/PhysRevLett.96.026103.
Dervaux, J., Cormier, P.-A., Konstantinidis, S., Di Ciuccio, R., Coulembier, O., Dubois, P., Snyders, R., Deposition of porous titanium oxide thin films as anode material for dye sensitized solar cells. Vacuum 114 (2015), 213–220, 10.1016/j.vacuum.2014.10.016.
Coly, Arona, Etudes expérimentales de sources d’ ions RCE à 2, 45GHz pour la production de courants intenses. 2010, Université de Grenoble.
Scherrer, P., Bestimmung der inneren Struktur und der Größe von Kolloidteilchen mittels Röntgenstrahlen. Nachr. Ges. Wiss. Göttingen. 2 (1918), 98–100, 10.1007/978-3-662-33915-2_7.
Thiry, D., Aparicio, F.J., Laha, P., Terryn, H., Snyders, R., Surface temperature: A key parameter to control the propanethiol plasma polymer chemistry. J. Vac. Sci. Technol. A Vac. Surf. Film 32 (2014), 050602–50604, 10.1116/1.4890672.
Möller, W., Eckstein, W., Tridyn — A TRIM simulation code including dynamic composition changes. Nucl. Instrum. Methods Phys. Res. Sect. B Beam Interact. Mater. Atoms. 2 (1984), 814–818, 10.1016/0168-583X(84)90321-5.
Möller, W., Eckstein, W., Biersack, J.P., Tridyn-binary collision simulation of atomic collisions and dynamic composition changes in solids. Comput. Phys. Commun. 51 (1988), 355–368, 10.1016/0010-4655(88)90148-8.
Biersack, J.P., Eckstein, W., Sputtering studies with the Monte Carlo Program TRIM.SP. Appl. Phys. A Solids Surf. 34 (1984), 73–94, 10.1007/BF00614759.
Eckstein, W., Biersack, J., Sputtering investigations with the Monte Carlo program TRIM SP. Nucl. Instrum. Methods Phys. Res. Sect. B Beam Interact. Mater. Atoms. 2 (1984), 550–554, 10.1016/0168-583X(84)90264-7.
J.F. Ziegler, Particle interactions with matter, (2011). http://www.srim.org.
Ziegler, J.F., Ziegler, M.D., Biersack, J.P., SRIM – The stopping and range of ions in matter. Nucl. Instruments Methods Phys. Res. Sect. B Beam Interact. Mater. Atoms. 268 (2010), 1818–1823, 10.1016/J.NIMB.2010.02.091.
Biersack, J.P., Haggmark, L.G., A Monte Carlo computer program for the transport of energetic ions in amorphous targets. Nucl. Instrum. Methods 174 (1980), 257–269, 10.1016/0029-554X(80)90440-1.
ASTM E-42, Standard Terminology Relating to Surface Analysis E 73-91c, Philadelphia, 1992.
Vickerman, J.C., Briggs, D., ToF-SIMS: Surface Analysis by Mass Spectrometry. 2001, IM Publications and SurfaceSpectra Limited.
de Hemptinne, M., Savard, J., Potentiel d’ ionisation et énergie de dissociation de la molécule d’ azote. J. Phys. Radium. 6 (1935), 499–506.
Douglas, A.E., The near ultraviolet bands of N2+ and the dissociation energies of the N2+ and N2 molecules. Can. J. Phys. 30 (1952), 302–313, 10.1139/p52-028.
Lazzeri, M., Vittadini, A., Selloni, A., Structure and energetics of stoichiometric TiO2 anatase surfaces. Phys. Rev. B 63 (2001), 155409–155419, 10.1103/PhysRevB.63.155409.
M. Lazzeri, A. Vittadini, A. Selloni, Erratum: Structure and energetics of stoichiometric TiO2 anatase surfaces [Phys. Rev. B 63, 155409-9 (2001)], Phys. Rev. B. 65 (2002) 119901–1. https://doi.org/10.1103/PhysRevB.65.119901.
Yao, M.H., Baird, R.J., Kunz, F.W., Hoost, T.E., An XRD and TEM investigation of the structure of alumina-supported ceria-zirconia. J. Catal. 166 (1997), 67–74, 10.1006/jcat.1997.1504.
Mohanty, D., Kalnaus, S., Meisner, R.A., Rhodes, K.J., Li, J., Payzant, E.A., Wood, D.L., Daniel, C., Structural transformation of a lithium-rich Li1.2Co 0.1Mn0.55Ni0.15O2 cathode during high voltage cycling resolved by in situ X-ray diffraction. J. Power Sources 229 (2013), 239–248, 10.1016/j.jpowsour.2012.11.144.
Ghicov, A., Macak, J.M., Tsuchiya, H., Kunze, J., Haeublein, V., Kleber, S., Schmuki, P., TiO2 nanotube layers: Dose effects during nitrogen doping by ion implantation. Chem. Phys. Lett. 419 (2006), 426–429, 10.1016/j.cplett.2005.11.102.