Composition-constitution-morphology relationship of Al2O3 thin films deposited by plasma assisted chemical vapor deposition

Snyders, Rony; Jiang, K.; Music, D.; Konstantinidis, Stéphanos; Markus, T.; Reinholdt, A.; Mayer, J.; Schneider, J-M.

Article (Scientific journals)

Snyders, Rony; Jiang, K.; Music, D. et al.

2009 • In Surface and Coatings Technology, 204 (1-2), p. 215-221

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Abstract :

[en] We have studied the correlation between the chemical composition, constitution and morphology of Al2O3 using experimental and theoretical means. Combining scanning electron microscopy, transmission electron microscopy, electron dispersive X-ray analysis a

Disciplines :

Chemistry
Physics

Author, co-author :

Snyders, Rony ; Université de Mons > Faculté des Sciences > Chimie des Interactions Plasma-Surface

Jiang, K.

Music, D.

Konstantinidis, Stéphanos ; Université de Mons > Faculté des Sciences > Chimie des Interactions Plasma-Surface

Markus, T.

Reinholdt, A.

Mayer, J.

Schneider, J-M.

Language :

English

Title :

Composition-constitution-morphology relationship of Al2O3 thin films deposited by plasma assisted chemical vapor deposition

Publication date :

01 January 2009

Journal title :

Surface and Coatings Technology

ISSN :

0257-8972

eISSN :

1879-3347

Publisher :

Elsevier, Netherlands

Volume :

204

Issue :

1-2

Pages :

215-221

Peer reviewed :

Peer Reviewed verified by ORBi

Research unit :

S882 - Chimie des Interactions Plasma-Surface

Research institute :

R400 - Institut de Recherche en Science et Ingénierie des Matériaux

Commentary :

Publié en ligne le 22 juillet 2009 Lecture en ligne: http://www.sciencedirect.com/science?_ob=MImg&_imagekey=B6TVV-4WTRS64-2-S&_cdi=5544&_user=532054&_pii=S0257897209005866&_origin=search&_coverDate=09%2F25%2F2009&_sk=997959998&view=c&wchp=dGLzVlz-zSkWA&md5=ec5b01f8c792a993e6fb45eb41ba2404

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