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• Pflug A, Siemers M, Melzig T, Keunecke M, Schäfer L and Braüer G 2016 Handbook of Software Solutions for ICME (New York: Wiley)
• Bultinck E and Bogaerts A 2011 Characterization of an Ar/O2 magnetron plasma by a multi-species Monte Carlo model Plasma Sources Sci. Technol. 20 045013
• Bultinck E and Bogaerts A 2009 Particle-in-cell/Monte Carlo collisions treatment of an Ar/O2 magnetron discharge used for the reactive sputter deposition of TiOx films New J. Phys. 11 103010
• Depla D, Heirwegh S, Mahieu S and De Gryse R 2007 Towards a more complete model for reactive magnetron sputtering J. Phys. D: Appl. Phys. 40 1957-65
• Glöß D, Frach P, Zywitzki O, Modes T, Klinkenberg S and Gottfried C 2005 Photocatalytic titanium dioxide thin films prepared by reactive pulse magnetron sputtering at low temperature Surf. Coat. Technol. 200 967-71
• Nadel S J and Greene P 2001 Strategies for high rate reactive sputtering Thin Solid Films 392 174-83
• Mohamed S H, Kappertz O, Leervad Pedersen T P, Drese R and Wuttig M 2003 Properties of TiOx coatings prepared by dc magnetron sputtering Phys. Status Solidi 198 224-37
• Hitosugi T, Ueda A, Nakao S, Yamada N, Furubayashi Y, Hirose Y, Shimada T and Hasegawa T 2007 Fabrication of highly conductive Ti1-x Nbx O2 polycrystalline films on glass substrates via crystallization of amorphous phase grown by pulsed laser deposition Appl. Phys. Lett. 90 20-3
• Alami J, Sarakinos K, Uslu F, Klever C, Dukwen J and Wuttig M 2009 On the phase formation of titanium oxide films grown by reactive high power pulsed magnetron sputtering J. Phys. D: Appl. Phys. 42 115204
• Löbl P, Huppertz M and Mergel D 1994 Nucleation and growth in TiO2 films prepared by sputtering and evaporation Thin Solid Films 251 72-9
• Sanz R, Romano L, Zimbone M, Buccheri M A, Scuderi V, Impellizzeri G, Scuderi M, Nicotra G, Jensen J and Privitera V 2015 UV-black rutile TiO2: An antireflective photocatalytic nanostructure J. Appl. Phys. 117 074903
• Cai J, Ye J, Chen S, Zhao X, Zhang D, Chen S, Ma Y, Jin S and Qi L 2012 Self-cleaning, broadband and quasi-omnidirectional antireflective structures based on mesocrystalline rutile TiO2 nanorod arrays Energy Environ. Sci. 5 7575-81
• Worasukhkhung S, Pudwat S, Eiamchai P, Horprathum M, Dumrongrattana S and Aiempanakit K 2012 Hydrophilic property of TiO2 films sputtered on glass/ITO for self cleaning glass and heat mirror application Proc. Eng. 32 780-6
• Liu Y, Wang X, Yang F and Yang X 2008 Excellent antimicrobial properties of mesoporous anatase TiO2 and Ag/TiO2 composite films Microporous Mesoporous Mater. 114 431-9
• Joost U, Juganson K, Visnapuu M, Mortimer M, Kahru A, Nõmmiste E, Joost U, Kisand V and Ivask A 2015 Photocatalytic antibacterial activity of nano-TiO2 (anatase)-based thin films: Effects on Escherichia coli cells and fatty acids J. Photochem. Photobiol. B 142 178-85
• Fu G, Vary P S and Lin C T 2005 Anatase TiO2 nanocomposites for antimicrobial coatings J. Phys. Chem. B 109 8889-98
• Watanabe T, Nakajima A, Wang R, Minabe M, Koizumi S, Fujishima A and Hashimoto K 1999 Photocatalytic activity and photoinduced hydrophilicity of titanium dioxide coated glass Thin Solid Films 351 260-3
• Lai Y, Tang Y, Gong J, Gong D, Chi L, Lin C and Chen Z 2012 Transparent superhydrophobic/superhydrophilic TiO2-based coatings for self-cleaning and anti-fogging J. Mater. Chem. 22 7420-6
• Tonneau R, Moskovkin P, Pflug A and Lucas S 2018 TiOx deposited by magnetron sputtering: A joint modelling and experimental study J. Phys. D: Appl. Phys. 51 195202
• Berg S and Nyberg T 2005 Fundamental understanding and modeling of reactive sputtering processes Thin Solid Films 476 215-30
• Lucas S and Moskovkin P 2010 Simulation at high temperature of atomic deposition, islands coalescence, Ostwald and inverse Ostwald ripening with a general simple kinetic Monte Carlo code Thin Solid Films 518 5355-61
• Tominaga K, Ito D and Miyamoto Y 2006 Energetic negative ions in titanium oxide deposition by reactive sputtering in Ar/O2 Vacuum 80 654-7
• Mahieu S and Depla D 2007 Correlation between electron and negative O-ion emission during reactive sputtering of oxides Appl. Phys. Lett. 90 2-4
• Kluth O, Schöpe G, Rech B, Menner R, Oertel M, Orgassa K and Schock H W 2006 Comparative material study on RF and DC magnetron sputtered ZnO:Al films Thin Solid Films 502 311-6
• Welzel T and Ellmer K 2012 Negative oxygen ion formation in reactive magnetron sputtering processes for transparent conductive oxides J. Vac. Sci. Technol. A 30 061306
• Amin A, Köhl D and Wuttig M 2010 The role of energetic ion bombardment during growth of TiO2 thin films by reactive sputtering J. Phys. D: Appl. Phys. 43 405303
• Thomann A L, Cormier P A, Dolique V, Semmar N, Dussart R, Lecas T, Courtois B and Brault P 2013 Energy transferred to the substrate surface during reactive magnetron sputtering of aluminum in Ar/O2 atmosphere Thin Solid Films 539 88-95
• Ellmer K and Welzel T 2012 Reactive magnetron sputtering of transparent conductive oxide thin films: Role of energetic particle (ion) bombardment J. Mater. Res. 27 765-79
• Mahieu S, Leroy W P, Van Aeken K and Depla D 2009 Modeling the flux of high energy negative ions during reactive magnetron sputtering J. Appl. Phys. 106 6-13
• Van Aeken K, Mahieu S and Depla D 2008 The metal flux from a rotating cylindrical magnetron: A Monte Carlo simulation J. Phys. D: Appl. Phys. 41 205307
• Pflug A, Siemers M, Schwanke C and Szyszka B 2010 Simulation von Plasma-Beschichtungsprozessen Vak. Forsch. Prax. 22 31-4
• Melzig T, Siemers M, Pflug A and Rank R 2014 3D PIC-MC simulation of anode effects in dual magnetron discharges Surf. Coat. Technol. 241 30-2
• Schwanke C, Pflug A, Siemers M and Szyszka B 2012 Applied Parallel and Scientific Computing vol 7133, ed K Jonasson (Berlin:Springer)
• Tonneau R, Pflug A and Lucas S 2020 Magnetron sputtering: Determining scaling relations towards real power discharges using 3D particle-in-cell Monte Carlo models Plasma Sources Sci. Technol. 29 115007
• Bird G A 1994 Molecular Gas Dynamics and the Direct Simulation of Gas Flows (Clarendon Press)
• Koura K and Matsumoto H 1991 Variable soft sphere molecular model for inverse-power-law or Lennard-Jones potential Phys. Fluids A 3 2459-65
• Alvarez R, Garcia-Martin J M, Garcia-Valenzuela A, Macias-Montero M, Ferrer F J, Santiso J, Rico V, Cotrino J, Gonzalez-Elipe A R and Palmero A 2015 Nanostructured Ti thin films by magnetron sputtering at oblique angles J. Phys. D: Appl. Phys. 49 45303
• Bogaerts A, Bultinck E, Eckert M, Georgieva V, Mao M, Neyts E and Schwaederle L 2009 Computer modeling of plasmas and plasma-surface interactions Plasma Processes Polym. 6 295-307
• Depla D, Mahieu S and De Gryse R 2009 Magnetron sputter deposition: Linking discharge voltage with target properties Thin Solid Films 517 2825-39
• Moller W, Eckstein W and Biersack J P 1988 Tridyn-binary collision simulation of atomic collisions and dynamic composition changes in solids Comput. Phys. Commun. 51 355-68
• Gudmundsson J T, Lundin D, Brenning N, Raadu M A, Huo C and Minea T M 2016 An ionization region model of the reactive Ar/O2 high power impulse magnetron sputtering discharge Plasma Sources Sci. Technol. 25 065004
• Dendy R O 1990 Plasma Dynamics (Wotton-under-Edge: Clarendon)
• Moens F, Kalvas T, Van Steenberge S and Depla D 2017 Effect of space charge on the negative oxygen flux during reactive sputtering J. Phys. D: Appl. Phys. 50 115201
• Robinson M T and Torrens I M 1974 Computer simulation of atomic-displacement cascades in solids in the binary-collision approximation Phys. Rev. B 9 5008-24
• Biersack J P and Haggmark L G 1980 A Monte Carlo computer program for the transport of energetic ions in amorphous targets Nucl. Instrum. Methods 174 257-69
• Santos I, Marques L A, Pelaz L and Lopez P 2009 Improved atomistic damage generation model for binary collision simulations J. Appl. Phys. 105 83530
• Ghoniem N M and Chou S P 1988 Binary collision Monte Carlo simulations of cascades in polyatomic ceramics J. Nucl. Mater. 155-7 1263-7
• Bait L, Azzouz L, Madaoui N and Saoula N 2017 Influence of substrate bias voltage on the properties of TiO2 deposited by radio-frequency magnetron sputtering on 304L for biomaterials applications Appl. Surf. Sci. 395 72-7
• Wang B, Wei S, Guo L, Wang Y, Liang Y, Xu B, Pan F, Tang A and Chen X 2017 Effect of deposition parameters on properties of TiO2 films deposited by reactive magnetron sputtering Ceram. Int. 43 10991-8
• Gauter S, Haase F and Kersten H 2019 Experimentally unraveling the energy flux originating from a DC magnetron sputtering source Thin Solid Films 669 8-18
• Mišina M, Shaginyan L R, Ma-cek M and Panjan P 2001 Energy resolved ion mass spectroscopy of the plasma during reactive magnetron sputtering Surf. Coat. Technol. 142-4 348-54
• Jiang N, Shen Y G, Mai Y W, Chan T and Tung S C 2004 Nanocomposite Ti-Si-N films deposited by reactive unbalanced magnetron sputtering at room temperature Mater. Sci. Eng. B 106 163-71
• Shen Y G, Mai Y W, McKenzie D R, Zhang Q C, McFall W D and McBride W E 2000 Composition, residual stress, and structural properties of thin tungsten nitride films deposited by reactive magnetron sputtering J. Appl. Phys. 88 1380-8
• Rode D L, Gaddam V R and Yi J H 2007 Subnanometer surface roughness of dc magnetron sputtered Al films J. Phys. D: Appl. Phys. 102 024303
• Van Steenberge S, Leroy W P, Hubin A and Depla D 2014 Momentum transfer driven textural changes of CeO2 thin films Appl. Phys. Lett. 105 111602
• Cormier P-A, Balhamri A, Thomann A-L, Dussart R, Semmar N, Lecas T, Snyders R and Konstantinidis S 2014 Titanium oxide thin film growth by magnetron sputtering: Total energy flux and its relationship with the phase constitution Surf. Coat. Technol. 254 291-7
• Thomann A L, Caillard A, Raza M, El Mokh M, Cormier P A and Konstantinidis S 2019 Energy flux measurements during magnetron sputter deposition processes Surf. Coat. Technol. 377 124887