In situ IR spectroscopy as a tool to better understand the growth mechanisms of plasma polymers thin films

Ligot, Sylvie; Thiry, D.; Cormier, P.A; Raynaud, Patrice; Dubois, Philippe; Snyders, Rony

Request a copy

Article (Scientific journals)

In situ IR spectroscopy as a tool to better understand the growth mechanisms of plasma polymers thin films

Ligot, Sylvie; Thiry, D.; Cormier, P.A et al.

2015 • In Plasma Processes and Polymers, 12, p. 1200-1207

Peer Reviewed verified by ORBi

Permalink
https://hdl.handle.net/20.500.12907/33990

Files (1)Send to Details Statistics Bibliography Similar publications

Files

Full Text

594 Dubois et al Plasma Process Polym 2015 12 1200_1207.pdf

Author postprint (762.66 kB)

Request a copy

All documents in ORBi UMONS are protected by a user license.

Send to

RIS BibTex APA Chicago Permalink X Linkedin

Details

Research center :

CIRMAP - Centre d'Innovation et de Recherche en Matériaux Polymères

Disciplines :

Chemistry

Author, co-author :

Ligot, Sylvie

Thiry, D.

Cormier, P.A

Raynaud, Patrice

Dubois, Philippe ; Université de Mons > Faculté des Sciences > Matériaux Polymères et Composites

Snyders, Rony ; Université de Mons > Faculté des Sciences > Chimie des Interactions Plasma-Surface

Language :

English

Title :

In situ IR spectroscopy as a tool to better understand the growth mechanisms of plasma polymers thin films

Publication date :

01 January 2015

Journal title :

Plasma Processes and Polymers

ISSN :

1612-8850

Publisher :

Wiley - VCH Verlag GmbH & Co., Germany

Volume :

Pages :

1200-1207

Peer reviewed :

Peer Reviewed verified by ORBi

Research unit :

S816 - Matériaux Polymères et Composites

Research institute :

R400 - Institut de Recherche en Science et Ingénierie des Matériaux

Available on ORBi UMONS :

since 14 December 2015

Statistics

Number of views

3 (0 by UMONS)

Number of downloads

0 (0 by UMONS)

More statistics

Scopus citations^®

Scopus citations^®
without self-citations

Bibliography

A. Michelmore, D. A. Steele, J. D. Whittle, J. W. Bradley, R. D. Short, RSC Adv. 2013, 3, 13540.
K. S. Siow, L. Britcher, S. Kumar, H. J. Griesser, Plasma Process. Polym. 2006, 3, 392.
S. Liu, A. Chen, Langmuir 2005, 21, 8409.
R. Förch, Z. Zhang, W. Knoll, Plasma Process. Polym. 2005, 2, 351.
K. Vasilev, J. Cook, H. J. Griesser, Exp. Rev. Med. Dev. 2009, 6, 553.
J. Friedrich, Plasma Process. Polym. 2011, 8, 783.
L. Denis, P. Marsal, Y. Olivier, T. Godfroid, R. Lazzaroni, M. Hecq, J. Cornil, R. Snyders, Plasma Process. Polym. 2010, 7, 172.
D. Hegemann, E. Körner, K. Albrecht, U. Schütz, S. Guimond, Plasma Processes Polym. 2010, 7, 889.
S. Guimond, U. Schütz, B. Hanselmann, E. Körner, D. Hegemann, Surf. Coat. Technol. 2011, 205, S447.
D. Hegemann, E. Körner, N. Blanchard, M. Drabik, S. Guimond, Appl. Phys. Lett. 2012, 101, 211603.
H. Biederman, Plasma Polymer Films. Imperial College Press, London, UK 2004. Vol. Chapter 6.
D. Hegemann, B. Hanselmann, S. Guimond, G. Fortunato, M.-N. Giraud, A. G. Guex, Surf. Coat. Technol. 2014, 255, 90.
G. Padron-Wells, B. C. Jarvis, A. K. Jindal, M. J. Goeckner, Colloids Surf. B: Biointerfaces 2009, 68, 163.
H. Biederman, Y. Osada, Plasma Polymerization Processes. Vol. 3 Academic Press, Inc, Amsterdam 1992.
R. d'Agostino, Plasma Deposition, Treatment, and Etching of Polymers. Academic Press, San Diego, USA 1990.
R. Prikryl, V. Cech, L. Zajickova, J. Vanek, S. Behzadi, F. R. Jones, Surf. Coat. Technol. 2005, 200, 468.
H. D. Hazrati, J. D. Whittle, K. Vasilev, Plasma Process. Polym. 2014, 11, 149.
D. Thiry, R. Francq, D. Cossement, M. Guillaume, J. Cornil, R. Snyders, Plasma Process. Polym. 2014, 11, 606.
S. A. Voronin, M. Zelzer, C. Fotea, M. R. Alexander, J. W. Bradley, J. Phys. Chem. B 2007, 111, 3419.
P. Raynaud, T. Amilis, Y. Segui, Appl. Surf. Sci. 1999, 138-139, 285.
R. Pierce, G. Padron-Wells, M. Goeckner, Plasma Chem. Plasma Process. 2009, 29, 1.
M. J. Goeckner, R. A. Breun, J. Vacuum Sci. Technol. A: Vacuum Surf. Films 1993, 11, 689.
R. Jafari, M. Tatoulian, F. Arefi-Khonsari, React. Funct. Polym. 2011, 71, 520.
C. Hopf, K. Letourneur, W. Jacob, T. Schwarz-Selinger, A. von Keudell, Appl. Phys. Lett. 1999, 74, 3800.
A. v. Keudell, Plasma Sources Sci. Technol. 2000, 9, 455.
S. Ligot, F. Renaux, L. Denis, D. Cossement, N. Nuns, P. Dubois, R. Snyders, Plasma Process. Polym. 2013, 10, 999.
S. Ligot, M. Guillaume, D. Thiry, V. Lemaur, P. Raynaud, T. Silva, B. Nikolay, J. Cornil, P. Dubois, R. Snyders, Plasma Process. Polym. 2015, 12, 405.
S. Ligot, M. Guillaume, P. Gerbaux, D. Thiry, F. Renaux, J. Cornil, P. Dubois, R. Snyders, J. Phys. Chem. B 2014, 118, 4201.
P. Raynaud, B. Despax, Y. Segui, H. Caquineau, Plasma Process. Polym. 2005, 2, 45.
5.2.0 ed.; Agilent Technologies: 2011.
F. Watts, J. Wolstenholme, An Introduction to Surface Analysis by XPS and AES. John Wiley & Sons, Chichester, UK 2003.
P. M. Software; ULVAC-PHI, Ed. 2009.
L. Denis, F. Renaux, D. Cossement, C. Bittencourt, N. Tuccitto, A. Licciardello, M. Hecq, R. Snyders, Plasma Process. Polym. 2011, 8, 127.
A. Chilkoti, B. D. Ratner, D. Briggs, Chem. Mater. 1991, 3, 51.
S. Ershov, F. Khelifa, P. Dubois, R. Snyders, ACS Appl. Mater. Interf. 2013, 5, 4216.
A. Michelmore, P. M. Bryant, D. A. Steele, K. Vasilev, J. W. Bradley, R. D. Short, Langmuir 2011, 27, 11943.
M. P. Seah, W. A. Dench, Surf. Interface Anal. 1979, 1, 2.
P. J. Cumpson, M. P. Seah, Surf. Interface Anal. 1997, 25, 430.
G. Derrien, J. Hassoun, S. Panero, B. Scrosati, Adv. Mater. 2007, 19, 2336.
A. Gabor, M.-P. Somorjai, Delplancke Chimie des Surfaces et Catalyse. Ediscience International, Paris, France 1995.
H. Yasuda, Plasma Polymerization. Academic Press, Inc., Orlando, USA 1985.
M. Dhayal, J. W. Bradley, Surf. Coat. Technol. 2004, 184, 116.
N. Inagaki, Plasma Surface Modification and Plasma Polymerization. Technomic Publication, Pennsylvania, USA 1996.
A. Grill, Cold Plasma in Materials Fabrication-From Fundamentals to Applications. IEEE Press, New York, USA 1994.
A. Choukourov, J. Kousal, D. Slavinska, H. Biederman, E. R. Fuoco, S. Tepavcevic, J. Saucedo, L. Hanley, Vacuum 2004, 75, 195.
P. N. Brookes, S. Fraser, R. D. Short, L. Hanley, E. Fuoco, A. Roberts, S. Hutton, J. Electron. Spectrosc. Relat. Phenom. 2001, 121, 281.
A. Michelmore, C. Charles, R. W. Boswell, R. D. Short, J. D. Whittle, ACS Appl. Mater. Interf. 2013, 5, 5387.
A. K. Jindal, A. J. Prengler, L. J. Overzet, M. J. Goeckner, J. Vacuum Sci. Technol. A: Vacuum Surf. Films 2006, 24, 126.
G. P. Wells, I. C. Estrada-Raygoza, P. L. S. Thamban, C. T. Nelson, C.-W. Chung, L. J. Overzet, M. J. Goeckner, Plasma Process. Polym. 2013, 10, 119.
D. Thiry, N. Britun, S. Konstantinidis, J.-P. Dauchot, M. Guillaume, J. Cornil, R. Snyders, J. Phys. Chem. C 2013, 117, 9843.
A. Von Keudell, M. Meier, C. Hopf, Diamond Relat. Mater. 2002, 11, 969.