Optimization of plasmonic multilayer stacks through control of magnetron sputtering deposition conditions.

Rassinfosse, Louis; Haye, Emile; Voué, Michel; Deparis, Olivier; Lucas, Stéphane

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Article (Scientific journals)

Optimization of plasmonic multilayer stacks through control of magnetron sputtering deposition conditions.

Rassinfosse, Louis; Haye, Emile; Voué, Michel et al.

2025 • In Vacuum

Peer Reviewed verified by ORBi

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https://hdl.handle.net/20.500.12907/52083

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Keywords :

FDTD; Magneton sputtering; Nanoparticles; Plasmonics; Spectroscopic ellipsometry

Research center :

CRPM - Physique des matériaux

Disciplines :

Physics

Author, co-author :

Rassinfosse, Louis

Haye, Emile; UNamur - Université de Namur

Voué, Michel ; Université de Mons - UMONS > Faculté des Sciences > Service de Physique des matériaux et Optique

Deparis, Olivier; UNamur - Université de Namur

Lucas, Stéphane; UNamur - Université de Namur

Language :

English

Title :

Optimization of plasmonic multilayer stacks through control of magnetron sputtering deposition conditions.

Publication date :

2025

Journal title :

Vacuum

ISSN :

0042-207X

Publisher :

Elsevier, United Kingdom

Peer reviewed :

Peer Reviewed verified by ORBi

Research unit :

S878 - Physique des matériaux et Optique

Research institute :

R400 - Institut de Recherche en Science et Ingénierie des Matériaux

Available on ORBi UMONS :

since 16 March 2025

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