Concomitant effects of the substrate temperature and the plasma chemistry on the chemical properties of propanethiol plasma polymer prepared by ICP discharges
[en] In this work, the plasma polymerization of propanethiol was investigated aiming to give new insights into the
growth mechanism of such material. The plasma polymers films (PPF) were synthesized using the two plasma
mode production of ICP discharges, namely the capacitive (E) and the inductive (H) mode. Using the E mode,
the atomic sulfur content in the PPF (at.%S) was found to be higher (~40%) than in the precursor (25%) which
was explained by the trapping of molecules presenting a high S/C ratio in the PPF network. This explanation is
validated by aging experiments revealing a strong decrease of at.%S likely due to the release of the trapped species.
In contrast, using the H mode, at.%S is significantly lower (17%-25%) and stable under aging. This different behavior
regarding chemical properties of the PPF as a function of the dischargemode used for their synthesis was understood
by considering the concomitant effect of the substrate temperature (Ts) and the plasma chemistry for both ICP
modes. It is shown that in the H mode, Ts ranges from 60 to 90 °C compared to 30-35 °C in E mode. This induces
a decrease of the residence time of the sulfur-based molecules at the growing film interface and, ultimately a decrease
of at.%S. On the other hand, experiments carried out for similar Ts but using bothmodes reveal the importance
of the plasma chemistry on the chemical composition of the films. Indeed, in these conditions, at.%S was correlated
to the amount of H2S in the dischargewhich is therefore identified as the trapped sulfur-basedmolecules. Our data
allow highlighting the concomitant effect of both substrate temperature and plasma chemistry in order to understand
the evolution of the chemical properties of propanethiol PPF prepared in the E andHmode of an ICP discharge.
Disciplines :
Architecture Chemistry Physics
Author, co-author :
Thiry, Damien
Aparicio, Francisco
Britun, Nikolay ; Université de Mons > Faculté des Sciences > Chimie des Interactions Plasma-Surface
Snyders, Rony ; Université de Mons > Faculté des Sciences > Chimie des Interactions Plasma-Surface
Language :
English
Title :
Concomitant effects of the substrate temperature and the plasma chemistry on the chemical properties of propanethiol plasma polymer prepared by ICP discharges
Publication date :
05 November 2013
Journal title :
Surface and Coatings Technology
ISSN :
0257-8972
eISSN :
1879-3347
Publisher :
Elsevier, Netherlands
Volume :
241
Pages :
2-7
Peer reviewed :
Peer Reviewed verified by ORBi
Research unit :
S882 - Chimie des Interactions Plasma-Surface
Research institute :
R400 - Institut de Recherche en Science et Ingénierie des Matériaux
Aparicio F.J., Holgado M., Borras A., Blaszczyk-Lezak I., Griol A., Barrios C.A., Casquel R., Sanza F.J., Sohlström H., Antelius M., González-Elipe A.R., Barranco A. Adv. Mater. 2011, 23:761-765.
Förch R., Zhang Z., Knoll W. Plasma Process. Polym. 2005, 2:351-372.
Morent R., De Geyter N., Jacobs T., Van Vlierberghe S., Dubruel P., Leys C., Schacht E. Plasma Process. Polym. 2009, 6:S537-S542.
Hegemann D., Schütz U., Körner E. Plasma Process. Polym. 2011, 8:689-694.
Inagaki N. Plasma Surface Modification and Plasma Polymerization 1996, Technomic Publishing, Lancaster.
Chapman B. Glow Discharge Processes 1980, A Wiley-Interscience Publication, New York.
Guimond S., Schütz U., Hanselmann B., Körner E., Hegemann D. Surf. Coat. Technol. 2011, 205(Supplement 2):S447-S450.
Hegemann D., Körner E., Blanchard N., Drabik M., Guimond S. Appl. Phys. Lett. 2012, 101:211603.
Timmons R.B., Griggs A.J. 2004, 217-245. Imperial College Press, London. H. Bierderman (Ed.).
Thiry D., Britun N., Konstantinidis S., Dauchot J.-P., Denis L., Snyders R. Appl. Phys. Lett. 2012, 100:071604.
Kersten H., Rohde D., Steffen H., Deutsch H., Hippler R., Swinkels G.H.P.M., Kroesen G.M.W. Appl. Phys. A 2001, 72:531-540.
Lopez G.P., Ratner B.D. Langmuir 1991, 7:766-773.
Von Keudell A. Plasma Sources Sci. Technol. 2000, 9:455-467.
Von Keudell A., Jacob W. J. Appl. Phys. 1996, 79:1092-1098.
Thiry D., Britun N., Konstantinidis S., Dauchot J.-P., Guillaume M., Cornil J., Snyders R. J. Phys. Chem. C 2013, 117:9843-9851.
Fantz U. Plasma Sources Sci. Technol. 2006, 15:S137.
Denis L., Thiry D., Cossement D., Gerbaux P., Brusciotti F., Van De Keere I., Goossens V., Terryn H., Hecq M., Snyders R. Prog. Org. Coat. 2011, 70:134-141.
Denis L., Renaux F., Cossement D., Bittencourt C., Tuccitto N., Licciardello A., Hecq M., Snyders R. Plasma Process. Polym. 2011, 8:127-137.
de Hoffmann E., Stroobant V. Mass Spectrometry: Principles and Applications 2001, John Wiley & Sons.
Haddow D.B., Goruppa A., Whittle J., Short R.D., Kahle O., Uhlig C., Bauer M. Chem. Mater. 2000, 12:866-868.
Alexander M.R., Duc T.M. Polymer 1999, 40:5479-5488.
Candan S., Beck A.J., Otoole L., Short R.D. J. Vac. Sci. Technol. A 1998, 16:1702-1709.
Vasilev K., Britcher L., Casanal A., Griesser H.J. J. Phys. Chem. B 2008, 112:10915-10921.
Swaraj S., Oran U., Lippitz A., Friedrich J.F., Unger W.E.S. Plasma Process. Polym. 2005, 2:572-580.
Jang S., Lee W. J. Vac. Sci. Technol. A 2001, 19:2335.
Haddow D.B., France R.M., Short R.D., Bradley J.W., Barton D. Langmuir 2000, 16:5654-5660.
Kersten H., Snijkers R.J.M.M., Schulze J., Kroesen G.M.W., Deutsch H., De Hoog F.J. Appl. Phys. Lett. 1994, 64:1496-1498.
Szmigiel D., Hibert C., Bertsch A., Pamuła E., Domański K., Grabiec P., Prokaryn P., Ścisłowska-Czarnecka A., Płytycz B. Plasma Process. Polym. 2008, 5:246-255.