Abstract :
[en] The physical and chemical aspects of plasma-surface interaction in high-power impulse
magnetron sputtering (HiPIMS) discharges are overviewed. The data obtained by various
plasma diagnostic methods representing the important sputtering discharge regions, namely
the cathode vicinity, plasma bulk, and substrate vicinity, are reported. After a detailed
introduction to the problem and description of the plasma characterization methods suitable
for pulsed magnetron discharge analysis, an overview of the recent plasma diagnostics
achievements in both non-reactive and reactive HiPIMS discharges is presented. Finally, the
conclusions and perspectives suggesting possible directions and research strategies for
increasing our knowledge in this domain are given.
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