[en] Physical backgrounds of a nitrogen fixation process in a nanosecond pulsed discharge in the presence of a plasma/liquid interface are reported. The role of OH radicals and O atoms in NO formation is experimentally revealed for the plasma operating in a single pulse mode and high-frequency burst. The kinetic curves demonstrate NO radical formation up to 10's of μs that well agrees with the observed OH radical behavior. The measurements in the single mode illustrate the sequence of the gas-phase chemistry that can be simplified as follows: electrons → N2(electronically excited) → O(D) → OH → NO. The increase of the operating frequency up to 100 kHz does not affect the pathway of NO formation in high electrical field plasma (such as dielectric barrier discharges or ns-pulsed plasma studied here). Independently of the frequency, the NO generation takes place through the extended Zeldovich mechanism dominantly driven by OH radicals because of the presence of the plasma/liquid interface whereas the O atoms' contribution in direct NO formation is low.
Disciplines :
Physics
Author, co-author :
Gromov, Mikhail ; Université de Mons - UMONS > Faculté des Sciences > Service de Chimie des Interactions Plasma-Surface ; Research Unit Plasma Technology (RUPT), Department of Applied Physics, Ghent University, Gent, Belgium
Leonova, Kseniia ; Université de Mons - UMONS > Faculté des Sciences > Service de Chimie des Interactions Plasma-Surface
Britun, Nikolay ; Université de Mons - UMONS ; Center for Low-temperature Plasma Sciences, Nagoya University, Nagoya, Japan
De Geyter, Nathalie; Research Unit Plasma Technology (RUPT), Department of Applied Physics, Ghent University, Gent, Belgium
Morent, Rino; Research Unit Plasma Technology (RUPT), Department of Applied Physics, Ghent University, Gent, Belgium
Snyders, Rony ; Université de Mons - UMONS > Faculté des Sciences > Service de Chimie des Interactions Plasma-Surface ; Materia Nova Research Centre, Mons, Belgium
Nikiforov, Anton; Research Unit Plasma Technology (RUPT), Department of Applied Physics, Ghent University, Gent, Belgium
Language :
English
Title :
Plasma nitrogen fixation in the presence of a liquid interface: role of OH radicals
Lehnert N., in Feeding the world in the 21st century: grand challenges in the nitrogen cycle, 2015, pp. 3-37
Smith C. Hill A. K. Torrente-Murciano L. Energy Environ. Sci. 2020 13 331 344 10.1039/C9EE02873K
Bogaerts A. Neyts E. C. ACS Energy Lett. 2018 3 1013 1027 10.1021/acsenergylett.8b00184
Uddi M. Jiang N. Adamovich I. V. Lempert W. R. J. Phys. D: Appl. Phys. 2009 42 075205 10.1088/0022-3727/42/7/075205
Cheng H. Li Y. Zheng K. Liu D. Lu X. J. Phys. D: Appl. Phys. 2021 54 184003 10.1088/1361-6463/abdf99
Popov N. A. Plasma Sources Sci. Technol. 2016 25 4003
Bruggeman P. J. Frontiera R. R. Kortshagen U. R. Kushner M. J. Linic S. Schatz G. C. Andaraarachchi H. Exarhos S. Jones L. O. Mueller C. M. Rich C. C. Xu C. Yue Y. Zhang Y. J. Appl. Phys. 2021 129 200902 10.1063/5.0044261
Lavole G. Heywood J. Keck J. Combust. Sci. Technol. 1970 1 313 326 10.1080/00102206908952211
Teodoru S. Kusano Y. Bogaerts A. Plasma Processes Polym. 2012 9 652 689 10.1002/ppap.201100187
Herron J. T. Plasma Chem. Plasma Process. 2001 21 581 609 10.1023/A:1012003218939
Abdelaziz A. A. Ishijima T. Osawa N. Seto T. Plasma Chem. Plasma Process. 2019 39 165 185 10.1007/s11090-018-9942-y
Hansen L. Schmidt-Bleker A. Bansemer R. Kersten H. Weltmann K. D. Reuter S. J. Phys. D: Appl. Phys. 2018 51 474002 10.1088/1361-6463/aad6f0
Tarabová B. Lukeš P. Janda M. Hensel K. Šikurová L. Machala Z. Plasma Processes Polym. 2018 15 e1800030 10.1002/ppap.201800030
Gromov M. Leonova K. De Geyter N. Morent R. Snyders R. Britun N. Nikiforov A. Plasma Sources Sci. Technol. 2021 30 14 10.1088/1361-6595/abff71
Fridman A. and Kennedy L. A., Plasma physics and engineering, CRC press, 2004
Verreycken T. Mensink R. Van Der Horst R. Sadeghi N. Bruggeman P. J. Plasma Sci. Technol. 2013 22 055014 10.1088/0963-0252/22/5/055014
Verreycken T. Van Der Horst R. M. Sadeghi N. Bruggeman P. J. J. Phys. D: Appl. Phys. 2013 46 464004 10.1088/0022-3727/46/46/464004
Stancu G. D. Kaddouri F. Lacoste D. A. Laux C. O. J. Phys. D: Appl. Phys. 2010 43 4002 10.1088/0022-3727/43/12/124002
Yagi I. Shirakawa Y. Hirakata K. Akiyama T. Yonemori S. Mizuno K. Ono R. Oda T. J. Phys. D: Appl. Phys. 2015 48 424006 10.1088/0022-3727/48/42/424006
Ono R. J. Phys. D: Appl. Phys. 2016 49 83001 10.1088/0022-3727/49/8/083001
Komuro A. Ono R. Oda T. J. Phys. D: Appl. Phys. 2013 46 175206 (13pp) 10.1088/0022-3727/46/17/175206
Manion J. A., Huie R. E., Levin R. D., Burgess Jr D. R., Orkin V. L., Tsang W., McGivern W. S., Hudgens J. W., Knyazev V. D. and Atkinson D. B., URL http//kinetics.nist.gov (access date 16.12.2021)