[en] The behavior of the ground state neutral and singly ionized atoms is studied in multipulse high power impulse magnetron sputtering processes. The time-resolved two-dimensional laser induced fluorescence was used for imaging the discharge volume (density mapping) during the plasma-on and plasma-off time phases. The role of the number of micropulses and delay time between the micropulses in the pulse package is analyzed and discussed systematically. In addition, the propagation of the sputtered particles from the target is investigated.
Disciplines :
Chimie
Auteur, co-auteur :
Hnilica, J. ; Department of Physical Electronics, Masaryk University, Brno, Czech Republic
Klein, P. ; Department of Physical Electronics, Masaryk University, Brno, Czech Republic
Vašina, P. ; Department of Physical Electronics, Masaryk University, Brno, Czech Republic
Snyders, Rony ; Université de Mons - UMONS > Faculté des Science > Service de Chimie des Interactions Plasma-Surface ; Materia Nova Research Center, Mons, Belgium
Britun, NIKOLAY ; Université de Mons - UMONS > Faculté des Science > Service de Chimie des Interactions Plasma-Surface
Langue du document :
Anglais
Titre :
Dynamics of sputtered particles in multipulse HiPIMS discharge
Ministry of Education, Youth and Sports of the Czech Republic
Subventionnement (détails) :
This research was supported by Project LM2023039 funded by the Ministry of Education, Youth and Sports of the Czech Republic. N Britun acknowledges the support of the ‘REFORGAS GreenWin’ project (Grant No. 7267).
Helmersson U Lattemann M Bohlmark J Ehiasarian A P Gudmundsson J T 2006 Thin Solid Films 513 1 24 1-24 10.1016/j.tsf.2006.03.033
Gudmundsson J Brenning N Lundin D Helmersson U 2012 J. Vac. Sci. Technol. A 30 030801 10.1116/1.3691832
Lundin D Tiberiu M Gudmundsson J T 2019 High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications 1st edn Amsterdam Elsevier
Ehiasarian A Münz W D Hultman L Helmersson U Petrov I 2003 Surf. Coat. Technol. 163-164 267 72 267-72 10.1016/S0257-8972(02)00479-6
Magnus F Ingason A S Sveinsson O Olafsson S Gudmundsson J T 2011 Thin Solid Films 520 1621 4 1621-4 10.1016/j.tsf.2011.07.041
Souček P Daniel J Hnilica J Bernátová K Zábranský L Buršíková V Stupavská M Vašina P 2017 Surf. Coat. Technol. 311 257 67 257-67 10.1016/j.surfcoat.2017.01.021
Cemin F Abadias G Minea T Furgeaud C Brisset F Solas D Lundin D 2017 Acta Mater. 141 120 30 120-30 10.1016/j.actamat.2017.09.007
Samuelsson M Lundin D Jensen J Raadu M A Gudmundsson J T Helmersson U 2010 Surf. Coat. Technol. 205 591 6 591-6 10.1016/j.surfcoat.2010.07.041
Hála M Čapek J Zabeida O Klemberg-Sapieha J Martinu L 2012 J. Phys. D: Appl. Phys. 45 055204 10.1088/0022-3727/45/5/055204
Chistyakov R Abraham B Sproul W D 2006 Advances in high power pulse reactive magnetron sputtering Proc. Annual Technical Conf.-Society of Vacuum Coaters vol 49 pp 16 19 pp 16-19
Chistyakov R Abraham B Sproul W Moore J Lin J 2007 Modulated pulse power technology and deposition for protective and tribological coatings Proc. Annual Technical Conf.-Society of Vacuum Coaters vol 50 pp 139 43 pp 139-43
Lin J Moore J J Sproul W D Mishra B Rees J A Wu Z Chistyakov R Abraham B 2009 Surf. Coat. Technol. 203 3676 85 3676-85 10.1016/j.surfcoat.2009.05.048
Lin J Moore J J Sproul W D Mishra B Wu Z Wang J 2010 Surf. Coat. Technol. 204 2230 9 2230-9 10.1016/j.surfcoat.2009.12.013
Liebig B Braithwaite N S J Kelly P Chistyakov R Abraham B Bradley J W 2011 Surf. Coat. Technol. 205 S312 6 S312-6 10.1016/j.surfcoat.2011.01.017
Lin J Sproul W D Moore J J Lee S Myers S 2011 Surf. Coat. Technol. 205 3226 34 3226-34 10.1016/j.surfcoat.2010.11.039
Lin J Sproul W D Wei R Chistyakov R 2014 Surf. Coat. Technol. 258 1212 22 1212-22 10.1016/j.surfcoat.2014.06.061
Lin J Chistyakov R 2017 Appl. Surf. Sci. 396 129 37 129-37 10.1016/j.apsusc.2016.11.025
Lin J Wang B Sproul W D Ou Y Dahan I 2013 J. Phys. D: Appl. Phys. 46 084008 10.1088/0022-3727/46/8/084008
Ferreira F Serra R Oliveira J C Cavaleiro A 2014 Surf. Coat. Technol. 258 249 56 249-56 10.1016/j.surfcoat.2014.09.020
Oliveira J C Fernandes F Ferreira F Cavaleiro A 2015 Surf. Coat. Technol. 264 140 9 140-9 10.1016/j.surfcoat.2014.12.065
Ferreira F Aijaz A Kubart T Cavaleiro A Oliveira J 2018 Surf. Coat. Technol. 336 92 98 92-98 10.1016/j.surfcoat.2017.10.055
Oskirko V O Zakharov A N Pavlov A P Solovyev A A Grenadyorov A S Semenov V A 2020 Surf. Coat. Technol. 387 125559 10.1016/j.surfcoat.2020.125559
Oliveira J Ferreira F Serra R Kubart T Vitelaru C Cavaleiro A 2020 Coatings 10 914 10.3390/coatings10100914
Anders A 2017 J. Appl. Phys. 121 171101 10.1063/1.4978350
In J H Seo S H Chang H Y 2008 Surf. Coat. Technol. 202 5298 301 5298-301 10.1016/j.surfcoat.2008.06.141
Barker P M Lewin E Patscheider J 2013 J. Vac. Sci. Technol. A 31 060604 10.1116/1.4819296
Barker P M Konstantinidis S Lewin E Britun N Patscheider J 2014 Surf. Coat. Technol. 258 631 8 631-8 10.1016/j.surfcoat.2014.08.025
Antonin O Tiron V Costin C Popa G Minea T 2014 J. Phys. D: Appl. Phys. 48 015202 10.1088/0022-3727/48/1/015202
Anders A Andersson J Ehiasarian A 2007 J. Appl. Phys. 102 113303 10.1063/1.2817812
Horwat D Anders A 2010 J. Appl. Phys. 108 123306 10.1063/1.3525986
Shimizu T Zanáška M Villoan R P Brenning N Helmersson U Lundin D 2021 Plasma Sources Sci. Technol. 30 045006 10.1088/1361-6595/abec27
Rudolph M Brenning N Raadu M A Hajihoseini H Gudmundsson J T Anders A Lundin D 2020 Plasma Sources Sci. Technol. 29 05LT01 10.1088/1361-6595/ab8175
Anders A 2011 Surf. Coat. Technol. 205 S1 S9 S1-S9 10.1016/j.surfcoat.2011.03.081
Konstantinidis S Dauchot J P Ganciu M Ricard A Hecq M 2006 J. Appl. Phys. 99 013307 10.1063/1.2159555
Leroy W P Konstantinidis S Mahieu S Snyders R Depla D 2011 J. Phys. D: Appl. Phys. 44 115201 10.1088/0022-3727/44/11/115201
Franz R Clavero C Bolat R Mendelsberg R Anders A 2014 Plasma Sources Sci. Technol. 23 035001 10.1088/0963-0252/23/3/035001
Solovyev A A Oskirko V O Semenov V A Oskomov K V Rabotkin S V 2016 J. Electron. Mater. 45 4052 60 4052-60 10.1007/s11664-016-4582-6
Huo C Ji Y Xie S Song R Chen Q 2021 AIP Adv. 11 125220 10.1063/5.0062990
Tiron V Velicu I L Vasilovici O Popa G 2015 J. Phys. D: Appl. Phys. 48 495204 10.1088/0022-3727/48/49/495204
Tiron V Velicu I L Dobromir M Demeter A Samoila F Ursu C Sirghi L 2016 Thin Solid Films 603 255 61 255-61 10.1016/j.tsf.2016.02.025
Velicu I L Tiron V Porosnicu C Burducea I Lupu N Stoian G Popa G Munteanu D 2017 Appl. Surf. Sci. 424 397 406 397-406 10.1016/j.apsusc.2017.01.067
Tiron V Velicu I L Porosnicu C Burducea I Dinca P Malinský P 2017 Appl. Surf. Sci. 416 878 84 878-84 10.1016/j.apsusc.2017.04.183
Fekete M Hnilica J Vitelaru C Minea T Vašina P 2017 J. Phys. D: Appl. Phys. 50 365202 10.1088/1361-6463/aa7e6d
Demeter A Samoila F Tiron V Stanescu D Magnan H Straticiuc M Burducea I Sirghi L 2017 Surf. Coat. Technol. 324 614 9 614-9 10.1016/j.surfcoat.2016.10.011
Tiron V Velicu I L Cristea D Lupu N Stoian G Munteanu D 2018 Surf. Coat. Technol. 352 690 8 690-8 10.1016/j.surfcoat.2017.11.048
Souček P Hnilica J Klein P Fekete M Vašina P 2021 Surf. Coat. Technol. 423 127624 10.1016/j.surfcoat.2021.127624
Tiron V Velicu I L Mihăilă I Popa G 2018 Surf. Coat. Technol. 337 484 91 484-91 10.1016/j.surfcoat.2018.01.065
Kimura T Sakai K 2020 Diam. Relat. Mater. 108 107996 10.1016/j.diamond.2020.107996
Britun N Palmucci M Konstantinidis S Snyders R 2015 J. Appl. Phys. 117 163302 10.1063/1.4919006
Britun N Konstantinidis S Snyders R 2015 Plasma Process. Polym. 12 1010 27 1010-27 10.1002/ppap.201500051
Hnilica J Klein P Vašina P Snyders R Britun N 2020 J. Appl. Phys. 128 043303 10.1063/5.0009378
Hnilica J Klein P Vašina P Snyders R Britun N 2020 J. Appl. Phys. 128 043304 10.1063/5.0009380
Britun N Hnilica J 2020 J. Appl. Phys. 127 211101 10.1063/5.0006586
Britun N Palmucci M Konstantinidis S Snyders R 2015 J. Appl. Phys. 117 163303 10.1063/1.4919007
Britun N Michiels M Snyders R 2015 Rev. Sci. Instrum. 86 123114 10.1063/1.4938250
Vašina P Fekete M Hnilica J Klein P Dosoudilová L Dvořák P Navrátil Z 2015 Plasma Sources Sci. Technol. 24 065022 10.1088/0963-0252/24/6/065022
Bernátová K Fekete M Klein P Hnilica J Vašina P 2020 Plasma Sources Sci. Technol. 29 055010 10.1088/1361-6595/ab82b1
de Poucques L Imbert J C Boisse-Laporte C Bretagne J Ganciu M Teulé-Gay L Vasina P Touzeau M 2007 Plasma Process. Polym. 4 S424 9 S424-9 10.1002/ppap.200731102
Vitelaru C de Poucques L Minea T Popa G 2011 J. Appl. Phys. 109 053307 10.1063/1.3553395
Poolcharuansin P Bradley J W 2010 Plasma Sources Sci. Technol. 19 025010 10.1088/0963-0252/19/2/025010
Payling R Larkins P 2000 Optical Emission Lines of the Elements New York Wiley
Britun N Gaillard M Oh S G Han J G 2007 J. Phys. D: Appl. Phys. 40 5098 10.1088/0022-3727/40/17/015
Britun N Palmucci M Konstantinidis S Gaillard M Snyders R 2013 J. Appl. Phys. 114 013301 10.1063/1.4812579
Vitelaru C Lundin D Stancu G D Brenning N Bretagne J Minea T 2012 Plasma Sources Sci. Technol. 21 025010 10.1088/0963-0252/21/2/025010
Butler A Brenning N Raadu M A Gudmundsson J T Minea T Lundin D 2018 Plasma Sources Sci. Technol. 27 105005 10.1088/1361-6595/aae05b
Britun N Han J G Oh S G 2008 Plasma Sources Sci. Technol. 17 045013 10.1088/0963-0252/17/4/045013
Kudrle V LeDuc E Fitaire M 1999 J. Phys. D: Appl. Phys. 32 2049 10.1088/0022-3727/32/16/313
Evans C J 1987 J. Phys. D: Appl. Phys. 20 55 10.1088/0022-3727/20/1/009
Vašina P Meško M Ganciu M Bretagne J Boisse-Laporte C de Poucques L Touzeau M 2005 Europhys. Lett. 72 390 10.1209/epl/i2005-10243-7
Vašina P Meško M Imbert J C Ganciu M Boisse-Laporte C de Poucques L Touzeau M Pagnon D Bretagne J 2007 Plasma Sources Sci. Technol. 16 501 10.1088/0963-0252/16/3/009
Anders A Yushkov G Y 2009 J. Appl. Phys. 105 073301 10.1063/1.3097390
Yushkov G Y Anders A 2010 IEEE Trans. Plasma Sci. 38 3028 34 3028-34 10.1109/TPS.2010.2063041
Hippler R Hubicka Z Cada M Ksirova P Wulff H Helm C A Stranak V 2017 J. Appl. Phys. 121 171906 10.1063/1.4977823
Klein P Hnilica J Hubička Z Čada M Šlapanská M Zemánek M Vašina P 2017 Plasma Sources Sci. Technol. 26 055015 10.1088/1361-6595/aa62ee
Hnilica J Klein P Šlapanská M Fekete M Vašina P 2018 J. Phys. D: Appl. Phys. 51 095204 10.1088/1361-6463/aaa7d3
Klein P Hnilica J Zemánek M Bradley J W Vašina P 2019 J. Phys. D: Appl. Phys. 52 125201 10.1088/1361-6463/aafab3
Lundin D Brenning N Jädernäs D Larsson P Wallin E Lattemann M Raadu M A Helmersson U 2009 Plasma Sources Sci. Technol. 18 045008 10.1088/0963-0252/18/4/045008
Raadu M Axnäs I Gudmundsson J T Huo C Brenning N 2011 Plasma Sources Sci. Technol. 20 065007 10.1088/0963-0252/20/6/065007
Anders A 2012 Appl. Phys. Lett. 100 224104 10.1063/1.4724205
de Poucques L Imbert J C Boisse-Laporte C Bretagne J Ganciu M Teulé-Gay L Touzeau M 2006 Plasma Sources Sci. Technol. 15 661 10.1088/0963-0252/15/4/010
Bernátová K Klein P Hnilica J Vašina P 2021 Plasma Sources Sci. Technol. 30 125002 10.1088/1361-6595/ac333f
Alami J Sarakinos K Mark G Wuttig M 2006 Appl. Phys. Lett. 89 154104 10.1063/1.2362575
Vlček J Pajdarová A D Musil J 2004 Contrib. Plasma Phys. 44 426 36 426-36 10.1002/ctpp.200410083
