Article (Scientific journals)
Alternative to classic annealing treatments for fractally patterned TiO2 thin films
Van Overschelde, Olivier; Guisbiers, Gregory; Hamadi, F. et al.
2008In Journal of Applied Physics, 104
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Disciplines :
Electrical & electronics engineering
Physics
Author, co-author :
Van Overschelde, Olivier ;  Université de Mons > Faculté des Sciences > Chimie des Interactions Plasma-Surface
Guisbiers, Gregory 
Hamadi, F.
Hemberg, A.
Snyders, Rony  ;  Université de Mons > Faculté des Sciences > Chimie des Interactions Plasma-Surface
Wautelet, Michel ;  Université de Mons > Faculté des Sciences > FS - Service du Doyen
Language :
English
Title :
Alternative to classic annealing treatments for fractally patterned TiO2 thin films
Publication date :
18 November 2008
Journal title :
Journal of Applied Physics
ISSN :
0021-8979
Publisher :
American Institute of Physics, United States - New York
Volume :
104
Peer reviewed :
Peer Reviewed verified by ORBi
Available on ORBi UMONS :
since 25 January 2013

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