HIGH-POWER IMPULSE MAGNETRON SPUTTERING OF WO3. INFLUENCE OF THE PULSE PARAMETERS ON THE DISCHARGE

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Hemberg, Axel; Renaux, F.; Dauchot, Jean-Pierre et al.

2011 • AVS 58th Annual International Symposium and Exhibition

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Abstract :

[en] HIGH-POWER IMPULSE MAGNETRON SPUTTERING OF WO3. INFLUENCE OF THE PULSE PARAMETERS ON THE DISCHARGE

Disciplines :

Chemistry
Physics

Author, co-author :

Hemberg, Axel ; Université de Mons > Unités externes > Materia Nova ASBL

Renaux, F.

Dauchot, Jean-Pierre ; Université de Mons > Faculté des Sciences > Chimie des Interactions Plasma-Surface

Snyders, Rony ; Université de Mons > Faculté des Sciences > Chimie des Interactions Plasma-Surface

Konstantinidis, Stéphanos ; Université de Mons > Faculté des Sciences > Service de Chimie des Interactions Plasma-Surface

Language :

English

Title :

HIGH-POWER IMPULSE MAGNETRON SPUTTERING OF WO3. INFLUENCE OF THE PULSE PARAMETERS ON THE DISCHARGE

Publication date :

30 October 2011

Number of pages :

Event name :

AVS 58th Annual International Symposium and Exhibition

Event place :

Nashville, United States - Tennessee

Event date :

2011

Research unit :

S882 - Chimie des Interactions Plasma-Surface

Research institute :

R400 - Institut de Recherche en Science et Ingénierie des Matériaux

Available on ORBi UMONS :

since 27 January 2012

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