Magnetic field topology for altering ion density in bipolar sputtering

[en] A drastic change in the spatial ion distribution in bipolar magnetron sputtering discharge is reported upon changing the magnetic field topology. In our case, a significant increase in ion number density at certain time delays is registered when topology is changed toward the unbalanced type. A transitory torch-shaped ionization zone consequently disappears, along with the low-energy part of the ion energy distribution, due to no additional ionization in this case.

Disciplines :

Physics

Author, co-author :

Michiels, Matthieu ; Université de Mons - UMONS ; Materia Nova Research Center, Mons, Belgium

Leonova, Kseniia ; Université de Mons - UMONS > Faculté des Sciences > Service de Chimie des Interactions Plasma-Surface

Godfroid, Thomas ; Université de Mons - UMONS ; Materia Nova Research Center, Mons, Belgium

Snyders, Rony ; Université de Mons - UMONS > Faculté des Sciences > Service de Chimie des Interactions Plasma-Surface ; Materia Nova Research Center, Mons, Belgium

Britun, Nikolay ; Université de Mons - UMONS ; Center for Low-Temperature Plasma Sciences, Nagoya University, Nagoya, Japan

Language :

English

Title :

Magnetic field topology for altering ion density in bipolar sputtering

Publication date :

August 2022

Journal title :

Applied Physics Letters

ISSN :

0003-6951

eISSN :

1077-3118

Publisher :

American Institute of Physics Inc.

Volume :

121

Issue :

Pages :

051603

Peer reviewed :

Peer Reviewed verified by ORBi

Additional URL :

https://aip.scitation.org/doi/pdf/10.1063/5.0096128

Research institute :

Research Institute for Materials Science and Engineering

Available on ORBi UMONS :

since 09 January 2023

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